A. T. Rakhimov

Часть публикаций из профиля, по году от новых к старым. Это не полный список последних работ автора; работы без года — в конце.

• Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching of SiO2 with high repeatability of cycles in industrial ICP reactor. II. Simulation2026
• Si and SiO2 sputtering by low-energy Ne+ ions in plasma conditions2025
• VUV radiation impact on O(3P) atom surface loss on Pyrex in DC discharge in mixtures of O2 with Ar, Kr and Xe2025
• Rate Coefficients for Vibrationally Inelastic Transitions of the $$\mathbf{O}\boldsymbol{(}{}^{\textbf{3}}\boldsymbol{P}_{\boldsymbol{g}}\boldsymbol{)+}\mathbf{O}_{\mathbf{2}}\boldsymbol{(}^{\mathbf{3}}{{\Sigma}}^{\boldsymbol{-}}_{\boldsymbol{g}}\boldsymbol{,v}\boldsymbol{)}$$ System on the O$${}_{\mathbf{3}}$$ Ground Electronic State Potential Energy Surface at 100–1000 K2025
• Rate coefficients for Vibrationally Inelastic Transitions of the O(3Pg)+O2(3Σ-g, v) System on the O3 Ground Electronic State Potential Energy Surface at 100-1000 K2025
• Actinometry of O, N and F atoms2017 · аннотациясвернуть

  Abstract The applicability of actinometry for measuring the absolute concentration of O, N and F atoms in discharge plasma was studied. For this purpose, concentrations of these atoms were measured downstream of an ICP…

• Carbon nanowalls: the next step for physical manifestation of the black body coating2013
• Singlet oxygen generation in O2flow excited by RF discharge: I. Homogeneous discharge mode: α-mode2005 · аннотациясвернуть

  The production and transport dynamics of O 2 ( a 1 Δ g ) and molecules as well as O( 3 P) atoms has been studied in an O 2 flow excited by a 13.56 MHz RF discharge in a quartz tube at pressures of 1–20 Torr. It has been…