D. G. Voloshin

Часть публикаций из профиля, по году от новых к старым. Это не полный список последних работ автора; работы без года — в конце.

• Etching of ruthenium in Ar/O2/Cl2 mixture: Experiment and numerical models2026
• Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching of SiO2 with high repeatability of cycles in industrial ICP reactor. II. Simulation2026
• Supplementary Material2026
• Nanostructured Etching of Ruthenium in Three-Component Cl2/O2/Ar Plasma2025
• Mechanisms of the Production and Destruction of Singlet Oxygen and Ozone in Fast-Flowing O/O2/N2 Gas Mixtures2024
• Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma2019 · аннотациясвернуть

  The recombination of O ( 3 P) atoms on the surface of a Pyrex tube containing a DC glow discharge in pure O 2 was studied over a wide range of pressure (0.2–10 Torr) and discharge current (10–40 mA) for two fixed…

• Low-kfilms modification under EUV and VUV radiation2013 · аннотациясвернуть

  Modification of ultra-low-k films by extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) emission with 13.5, 58.4, 106, 147 and 193 nm wavelengths and fluences up to 6 × 1018 photons cm−2 is studied experimentally…

• Experimental and theoretical study of dynamic effects in low-frequency capacitively coupled discharges2011 · аннотациясвернуть

  Abstract A low-frequency capacitively coupled radio-frequency (rf) discharge in Ar excited at 1.76 MHz is studied both experimentally and theoretically. Experimental measurements of electron concentration, discharge…