Т. В. Рахимова

Часть публикаций из профиля, по году от новых к старым. Это не полный список последних работ автора; работы без года — в конце.

• Influence of framework architecture on hydrogen plasma-induced structural evolution of porous organosilicate low-k dielectrics2026
• Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching of SiO2 with high repeatability of cycles in industrial ICP reactor. II. Simulation2026
• Supplementary Material2026
• Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. Part II: Simulation2026
• Nanostructured Etching of Ruthenium in Three-Component Cl2/O2/Ar Plasma2025
• Plasma processing of low-k dielectrics2013 · аннотациясвернуть

  This paper presents an in-depth overview of the present status and novel developments in the field of plasma processing of low dielectric constant (low-k) materials developed for advanced interconnects in ULSI…

• Deflagration-to-detonation transition in highly reactive combustible mixtures2010
• Singlet oxygen generation in O2flow excited by RF discharge: I. Homogeneous discharge mode: α-mode2005 · аннотациясвернуть

  The production and transport dynamics of O 2 ( a 1 Δ g ) and molecules as well as O( 3 P) atoms has been studied in an O 2 flow excited by a 13.56 MHz RF discharge in a quartz tube at pressures of 1–20 Torr. It has been…